Park Systems announced the launch of Park NX-Hybrid WLI,?the first fully integrated system that combines Atomic Force Microscope (AFM) with White Light?Interferometer (WLI) profilometry.? White light interferometry (WLI) is a nondestructive, non-contact, optical technique used to generate 2D and 3D models of surfaces now widely used? for semiconductor production quality assurance. Park Systems introduces the Park NX-Hybrid WLI as a powerful semiconductor metrology tool that incorporates the best of AFM and WLI technologies into one seamless system.?The Park AFM in the integrated system is based on Park NX-Wafer, the industry leading automated atomic force microscopy system for semiconductor and related devices, manufacturing in-line quality assurance and research and development. The combined AFM/WLI system provides high throughput imaging over a very large area with the WLI module, and nanoscale metrology with sub-angstrom height resolution over the areas of interest using AFM. ?Defects of a patterned structure can be detected by comparing images of reference and target sample areas using high speed "hot spot detection", a technique enabled by fast localization for defect sites for high resolution AFM review. The Park WLI module supports both White Light Interferometry (WLI) and Phase Shifting Interferometry (PSI) modes. The PSI mode is enabled with a motorized filter changer and the two objective lenses can be replaced automatically by the motorized lens and supports objective lens magnification of 2.5x, 10x, 20x, 50x and ?features a 100x CMOS camera.?Fusing two complementary techniques, Park NX-Hybrid WLI is a comprehensive automated metrology system, providing substantial cost savings over two separate systems. The new Park NX-Hybrid is part of a series of hybrid metrology products Park Systems plans to offer this year to enhance and improve the utilization of atomic force microscopy across a wide range of industrial and academic research applications.