Veeco Instruments Inc. Announces Executive Changes
March 04, 2020 at 09:17 pm
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On March 2, 2020, the Board of Directors of Veeco Instruments Inc. and John R. Peeler, Chairman of the Board, mutually agreed that Mr. Peeler will resign his position as Chairman and Director of the Board, effective as of the conclusion of the company's Annual Meeting of Stockholders to be held on May 7, 2020. In addition, effective as of the conclusion of the company's Annual Meeting of Stockholders to be held on May 7, 2020, the size of the Board of Directors shall be reduced from nine directors to eight directors, and Richard A. D’Amore, a current Board member, will assume the position of Chairman of the Board and relinquish his position as Lead Director of the Board (which role will be consolidated into the role of Chairman of the Board).
Veeco Instruments Inc. is a manufacturer of semiconductor process equipment. The Company's laser annealing, ion beam, chemical vapor deposition (CVD), metal organic chemical vapor deposition (MOCVD), single wafer etch and clean and lithography technologies play an integral role in the fabrication and packaging of advanced semiconductor devices. The Company's system products include Laser Annealing Systems, Ion Beam Systems and Etch Systems, Advanced Packaging Lithography, Single Wafer Wet Processing, Metal Organic Chemical Vapor Deposition Systems, Molecular Beam Epitaxy Systems, Atomic Layer Deposition Systems, and Other Systems. Its other deposition systems include Physical Vapor Deposition, Diamond-Like Carbon Deposition, and Chemical Vapor Deposition Systems. Its process equipment systems are used in the production of a range of microelectronic components, including logic, dynamic random-access memory (DRAM), photonics devices, power electronics, and other semiconductor devices.